High-purity ALD precursor materials — stable supply, process-compatible, supporting thin-film applications end to end
Our materials partners provide equipment-related precursor supply and refill services. We also offer precursor cylinders fitted with level sensors, enabling precise control of precursor consumption across different processes, eliminating supply-shortage risk, and making cylinder swaps and preventive maintenance (PM) downtime easy to plan.
Beyond standard precursors, we look forward to partnering with customers to co-develop new materials needed for next-generation processes.
Key ALD precursors and purity specs, organized by application area
| Application | Product Name | Purity |
|---|---|---|
| Low-k Dielectrics | OMCATS · DMDMOS | >6N |
| High-k Dielectrics | TAETO (Ta₂O₅ Precursor) | >6N |
| High-k Dielectrics | TEMAH · HfCl₄ (ALD HfO₂ Precursor) | >6N |
| High-k Dielectrics | TEMAZ (ALD ZrO₂ Precursor) | >6N |
| High-k Dielectrics | TMA (Al₂O₃ Precursor) | >6N |
| Metal Gate / Interconnect Metal | TiCl₄ (Ti / TiN Precursor) | >6N |
| Metal Gate / Interconnect Metal | PDMAT (TaN Precursor) | >6N |
| Metal Gate / Interconnect Metal | CCTBA (Co Precursor) | >6N |
| Low-Temp Nitride / Oxide | HCDS · 3DMAS · BTBAS | >6N |
| Transparent Electrode | TEMASn · TDMASn · TMI · DEZ | >6N |
To meet the demanding precursor-delivery requirements of ALD processes, ALDO Technology provides an integrated solution spanning cylinder design, level detection, and liquid delivery — helping customers reliably manage material usage and reduce risk and downtime across both production and R&D settings.
For inquiries about custom cylinders, level gauges, or related precursor-delivery integration solutions, please contact us with your process details so we can evaluate the best configuration for your needs.